Trimethylsilane
Trimethylsilane is the organosilicon compound with the formula 3SiH. It is a trialkylsilane. The Si-H bond is reactive. It is less commonly used as a reagent than the related triethylsilane, which is a liquid at room temperature.
Trimethylsilane is used in the semi-conductor industry as precursor to deposit dielectrics and barrier layers via plasma-enhanced chemical vapor deposition.. It is also used a source gas to deposit TiSiCN hard coatings via plasma-enhanced magnetron sputtering. It has also been used to deposit silicon carbide hard coatings via low-pressure chemical vapor deposition at relatively low temperatures <1000oC. It is an expensive gas but safer to use than silane ; and produces properties in the coatings that cannot be undertaken by multiple source gases containing silicon and carbon.
